as.mask(w, eps=NULL, dimyx=NULL, xy=NULL)
"owin"
) or data acceptable
to as.owin
."owin"
)
of type "mask"
representing a binary pixel image.w
, and stores the results as a binary pixel image
or `mask' (an object of class "owin"
, see owin.object
). The most common use of this function is to approximate the shape
of another window w
by a binary pixel image. In this case,
we will usually want to have a very fine grid of pixels.
This function can also be used to generate a coarsely-spaced grid of locations inside a window, for purposes such as subsampling and prediction.
The grid spacing and location are controlled by the
arguments eps
, dimyx
and xy
,
which are mutually incompatible.
If eps
is given, then it determines the grid spacing.
If eps
is a single number,
then the grid spacing will be approximately eps
in both the $x$ and $y$ directions. If eps
is a
vector of length 2, then the grid spacing will be approximately
eps[1]
in the $x$ direction and
eps[2]
in the $y$ direction.
If dimyx
is given, then the pixel grid will be an
$m \times n$ rectangular grid
where $m, n$ are given by dimyx[2]
, dimyx[1]
respectively. Warning: dimyx[1]
is the number of
pixels in the $y$ direction, and dimyx[2]
is the number
in the $x$ direction.
If xy
is given, then this should be a structure
containing two elements x
and y
which are the
vectors of $x$ and y
coordinates of the margins
of the grid. The pixel coordinates will be generated
from these two vectors. In this case w
may be omitted.
If neither eps
nor dimyx
nor xy
is given,
the pixel raster dimensions are obtained from
spatstat.options("npixel")
.
There is no inverse of this function. However, the function
as.polygonal
will compute a polygonal approximation
of a binary mask.
owin.object
,
as.rectangle
,
as.polygonal
,
spatstat.options
w <- owin(c(0,10),c(0,10), poly=list(x=c(1,2,3,2,1), y=c(2,3,4,6,7)))
plot(w)
m <- as.mask(w)
plot(m)
x <- 1:9
y <- seq(0.25, 9.75, by=0.5)
m <- as.mask(w, xy=list(x=x, y=y))
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